Tinck, StefanStefanTinckAltamirano Sanchez, EfrainEfrainAltamirano SanchezDe Schepper, PeterPeterDe SchepperBogaerts, AnnemieAnnemieBogaerts2021-10-222021-10-2220141612-8850https://imec-publications.be/handle/20.500.12860/24615Layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma: a modeling investigationJournal articlehttp://onlinelibrary.wiley.com/doi/10.1002/ppap.201300062/abstract