Kim, Il HwanIl HwanKimKim, InsungInsungKimPark, ChangminChangminParkLee, JsiunJsiunLeeRyu, KoungminKoungminRyuDe Schepper, P.P.De SchepperDoise, J.J.DoiseKocsis, M.M.KocsisDe Simone, DaniloDaniloDe SimoneKljucar, LukaLukaKljucarDas, PoulomiPoulomiDasBlanc, RomualdRomualdBlancBeral, ChristopheChristopheBeralSeveri, JorenJorenSeveriVandenbroeck, NadiaNadiaVandenbroeckFoubert, PhilippePhilippeFoubertCharley, Anne-LaureAnne-LaureCharleyOak, ApoorvaApoorvaOakXu, DongboDongboXuGillijns, WernerWernerGillijnsMitard, JeromeJeromeMitardTokei, ZsoltZsoltTokeivan der Veen, MarleenMarleenvan der VeenHeylen, NancyNancyHeylenTeugels, LieveLieveTeugelsLe, Quoc ToanQuoc ToanLeSchleicher, FilipFilipSchleicherLeray, PhilippePhilippeLerayRonse, KurtKurtRonse2022-03-112022-03-112021978-1-5106-4051-10277-786XWOS:000672825700013https://imec-publications.be/handle/20.500.12860/3940828nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV LithographyProceedings paper10.1117/12.2584713978-1-5106-4052-8WOS:000672825700013