Passi, VikramVikramPassiSodervall, UlfUlfSodervallNilsson, BengtBengtNilssonPetersson, BengtBengtPeterssonHagberg, MatsMatsHagbergKrzeminski, ChristopheChristopheKrzeminskiDubois, EmmanuelEmmanuelDuboisDu Bois, BertBertDu BoisRaskin, Jean-PierreJean-PierreRaskin2021-10-202021-10-2020120167-9317https://imec-publications.be/handle/20.500.12860/21259Anisotropic vapor HF etching of silicon dioxide for Si microstructure releaseJournal articlehttps://doi.org/10.1016/j.mee.2012.01.005