Effects of oxygen and fluorine on the dry etch characteristics of organic low-k dielectrics

Baklanov, MikhaïlMikhaïlBaklanovVanhaelemeersch, SergeSergeVanhaelemeerschBender, HugoHugoBenderMaex, KarenKarenMaex2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3210Effects of oxygen and fluorine on the dry etch characteristics of organic low-k dielectricsJournal article