Challenges in integration of metal gate high-k dielectrics gate stacks

Tsai, W.W.TsaiRagnarsson, Lars-AkeLars-AkeRagnarssonSchram, TomTomSchramDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9692Challenges in integration of metal gate high-k dielectrics gate stacksProceedings paper