Proximity effects in dry developed lithography for sub-0.35 µm application

Goethals, MiekeMiekeGoethalsBaik, Ki-HoKi-HoBaikRonse, KurtKurtRonseVertommen, JohanJohanVertommenVan den hove, LucLucVan den hove2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/174Proximity effects in dry developed lithography for sub-0.35 µm applicationProceedings paper