Role of defects in the reliability of HfO2/Si-based spacer dielectric stacks for local interconnects

Wu, ChenChenWuVaisman Chasin, AdrianAdrianVaisman ChasinPadovani, AndreaAndreaPadovaniLesniewska, AlicjaAlicjaLesniewskaDemuynck, StevenStevenDemuynckCroes, KristofKristofCroes2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/34453Role of defects in the reliability of HfO2/Si-based spacer dielectric stacks for local interconnectsProceedings paperhttps://ieeexplore.ieee.org/document/8720534