In-line and non-destructive analysis of epitaxial Si1-x-yGexCy by spectroscopic ellipsometry and comparison with other established techniques

Loo, RogerRogerLooMeunier-Beillard, PhilippePhilippeMeunier-BeillardDelhougne, RomainRomainDelhougneKoumoto, T.T.KoumotoGeenen, LucLucGeenenBrijs, BertBertBrijsVandervorst, WilfriedWilfriedVandervorst2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7823In-line and non-destructive analysis of epitaxial Si1-x-yGexCy by spectroscopic ellipsometry and comparison with other established techniquesProceedings paper