DUV resist materials and processes for 0.25 μm and 0.18 μm CMOS devices

Op de Beeck, MaaikeMaaikeOp de BeeckVandenberghe, GeertGeertVandenbergheGoethals, MiekeMiekeGoethalsVan den hove, LucLucVan den hove2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1401DUV resist materials and processes for 0.25 μm and 0.18 μm CMOS devicesOral presentation