Plasma etch challenges and processing optimization in spin logic device fabrication

Canvel, YannYannCanvelSouriau, LaurentLaurentSouriauWan, DannyDannyWanTrovato, AnnaAnnaTrovatoThiam, ArameArameThiamTsvetanova, DianaDianaTsvetanovaCarpenter, RobertRobertCarpenterRaymenants, ElineElineRaymenantsAsselberghs, IngeIngeAsselberghsLazzarino, FredericFredericLazzarinoCouet, SebastienSebastienCouetKar, Gouri SankarGouri SankarKarNguyen, Van DaiVan DaiNguyen2024-04-092022-11-142024-04-092022-11-08https://imec-publications.be/handle/20.500.12860/40734Plasma etch challenges and processing optimization in spin logic device fabricationOral presentation