On the reliability of SIMS depth profiles through HfO2-stacks

Vandervorst, WilfriedWilfriedVandervorstBennett, J.J.BennettHuyghebaert, CedricCedricHuyghebaertConard, ThierryThierryConardGondran, C.C.GondranDe Witte, HildeHildeDe Witte2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9821On the reliability of SIMS depth profiles through HfO2-stacksJournal article