Behavior of hot hole stressed SiO2/Si interface at elevated temperatures

Zhang, JennyJennyZhangAl-Kofahi, I. S.I. S.Al-KofahiGroeseneken, GuidoGuidoGroeseneken2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/3169Behavior of hot hole stressed SiO2/Si interface at elevated temperaturesJournal article