Kim, Tae-GonTae-GonKimWostyn, KurtKurtWostynPark, Jin-ParkJin-ParkParkMertens, PaulPaulMertensBusnaina, Ahmed A.Ahmed A.Busnaina2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13952Pattern collapse and particle removal forces of interest to semiconductor fabrication processOral presentation