Application of moist ozone gas phase for removal of resist and organic contamination in a novel tank type processor

Wolke, K.K.WolkeRiedel, T.T.RiedelHaug, RainerRainerHaugDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeynsMeuris, MarcMarcMeuris2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4949Application of moist ozone gas phase for removal of resist and organic contamination in a novel tank type processorProceedings paper