Popescu, CarmenCarmenPopescuVesters, YannickYannickVestersMcClelland, AlexandraAlexandraMcClellandDe Simone, DaniloDaniloDe SimoneDawson, GuyGuyDawsonRoth, JohnJohnRothTheis, WolfgangWolfgangTheisVandenberghe, GeertGeertVandenbergheRobinson, AlexAlexRobinson2021-10-262021-10-2620180914-9244https://imec-publications.be/handle/20.500.12860/31552Multi trigger resist for EUV lithographyJournal articlehttps://doi.org/10.2494/photopolymer.31.227