Ronse, KurtKurtRonseCheng, ShauneeShauneeChengErcken, MoniqueMoniqueErckenLeunissen, PeterPeterLeunissenMaenhoudt, MireilleMireilleMaenhoudtVandenberghe, GeertGeertVandenbergheVan den hove, LucLucVan den hove2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11122Current status of 193 nm immersion lithography and outlook to the futureProceedings paper