A CDU comparison of double-patterning process options using Monte Carlo simulation

Hooge, JoshuaJoshuaHoogeHatakeyama, ShinichiShinichiHatakeyamaNafus, KathleenKathleenNafusScheer, StevenStevenScheerFoubert, PhilippePhilippeFoubertCheng, ShauneeShauneeChengLeray, PhilippePhilippeLeray2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15486A CDU comparison of double-patterning process options using Monte Carlo simulationProceedings paper