Correlation between field dependent electrical conduction and dielectric breakdown in a SiOCH based low-k (k=2.0) dielectric

Wu, ChenChenWuLi, YunlongYunlongLiBarbarin, YohanYohanBarbarinCiofi, IvanIvanCiofiCroes, KristofKristofCroesBoemmels, JuergenJuergenBoemmelsDe Wolf, IngridIngridDe WolfTokei, ZsoltZsoltTokei2021-10-212021-10-2120130003-6951https://imec-publications.be/handle/20.500.12860/23404Correlation between field dependent electrical conduction and dielectric breakdown in a SiOCH based low-k (k=2.0) dielectricJournal articlehttp://apl.aip.org/resource/1/applab/v103/i3/p032904_s1