Bearda, TwanTwanBeardaDe Gendt, StefanStefanDe GendtLoewenstein, LeeLeeLoewensteinKnotter, MartinMartinKnotterMertens, PaulPaulMertensHeyns, MarcMarcHeyns2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3214Behaviour of metallic contaminants during MOS processingProceedings paper