Schaekers, MarcMarcSchaekersVan Ammel, AnnemieAnnemieVan AmmelSchuhmacher, JorgJorgSchuhmacherDelabie, AnneliesAnneliesDelabieMartin Hoyas, AnaAnaMartin HoyasZhao, ChaoChaoZhao2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11170Implementation of atomic layer deposition in advanced semiconductor processesMeeting abstract