HfO2/spacer-interface breakdown in HfO2 high-k/poly-silicon gate stacks

Ranjan, RRRanjanPey, K.L.K.L.PeyTung, C.H.C.H.TungTang, L.J.L.J.TangElattari, BrahimBrahimElattariKauerauf, ThomasThomasKaueraufGroeseneken, GuidoGuidoGroesenekenDegraeve, RobinRobinDegraeveAng, D.S.D.S.AngBera, L.K.L.K.Bera2021-10-162021-10-162005-06https://imec-publications.be/handle/20.500.12860/11084HfO2/spacer-interface breakdown in HfO2 high-k/poly-silicon gate stacksJournal article