Le, Quoc ToanQuoc ToanLeDrieskens, FrederikFrederikDrieskensde Marneffe, Jean-FrancoisJean-Francoisde MarneffeConard, ThierryThierryConardLux, MarcelMarcelLuxStruyf, HerbertHerbertStruyfVereecke, GuyGuyVereecke2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17463Modification of post-etch residues by UV for wet removalMeeting abstract