Synchrotron measurement of the effect of line-width scaling on stress in advanced Cu/Low-k interconnects

Wilson, ChrisChrisWilsonCroes, KristofKristofCroesZhao, ChaoChaoZhaoMetzger, T.H.T.H.MetzgerZhao, LarryLarryZhaoBeyer, GeraldGeraldBeyerHorsfall, A.B.A.B.HorsfallO'Neill, A.G.A.G.O'NeillTokei, ZsoltZsoltTokei2021-10-182021-10-1820090021-8979https://imec-publications.be/handle/20.500.12860/16546Synchrotron measurement of the effect of line-width scaling on stress in advanced Cu/Low-k interconnectsJournal article