Breakdown induced thermo-chemical reactions in HfO2 high-k/poly-silicon gate stacks

Ranjan, R.R.RanjanPey, K.L.K.L.PeyTung, C.H.C.H.TungTang, L.J.L.J.TangAng, D.S.D.S.AngGroeseneken, GuidoGuidoGroesenekenDe Gendt, StefanStefanDe GendtBera, L.K.L.K.Bera2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11083Breakdown induced thermo-chemical reactions in HfO2 high-k/poly-silicon gate stacksJournal article