Howard, W.W.HowardWiaux, VincentVincentWiauxErcken, MoniqueMoniqueErckenBui, B.B.BuiByers, J.D.J.D.ByersPochkowski, M.M.Pochkowski2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6412Tuning and simulating a 193nm resist for 2D applicationsProceedings paper