CMP on SiGe materials – linking chemical and physical properties to design low defect and selective slurries

Ong, PatrickPatrickOngSiebert, MaxMaxSiebertLeunissen, Leonardus H. A.Leonardus H. A.LeunissenIbrahim, Sheikh Ansar UsmanSheikh Ansar UsmanIbrahimTeugels, LieveLieveTeugels2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/24345CMP on SiGe materials – linking chemical and physical properties to design low defect and selective slurriesProceedings paper