Pforr, RainerRainerPforrRonse, KurtKurtRonseJaenen, PatrickPatrickJaenenJonckheere, RikRikJonckheereVan den hove, LucLucVan den hovevan Oorschot, P.P.van OorschotLuehrman, P.P.Luehrman2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/295Improvement of the focus-exposure latitude using optimised illumination and mask designProceedings paper