Characterization of low-k dielectric etch residue on the sidewall by chemical force microscope

Kim, Tae-GonTae-GonKimLe, Quoc ToanQuoc ToanLeSuhard, SamuelSamuelSuhardLux, MarcelMarcelLuxVereecke, GuyGuyVereeckeClaes, MartineMartineClaesStruyf, HerbertHerbertStruyfDe Gendt, StefanStefanDe GendtMertens, PaulPaulMertensHeyns, MarcMarcHeyns2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17375Characterization of low-k dielectric etch residue on the sidewall by chemical force microscopeMeeting abstract