On the process and material sensitivities for high-k based dielectrics

Van Elshocht, SvenSvenVan ElshochtAdelmann, ChristophChristophAdelmannPopovici, Mihaela IoanaMihaela IoanaPopoviciSwerts, JohanJohanSwertsDelabie, AnneliesAnneliesDelabieNyns, LauraLauraNynsShi, XiaopingXiaopingShiTielens, HildeHildeTielensPourtois, GeoffreyGeoffreyPourtoisMenou, NicolasNicolasMenouBreuil, LaurentLaurentBreuilPierreux, DieterDieterPierreuxMaes, JanJanMaesHardy, AnAnHardyVan Bael, MarliesMarliesVan BaelJurczak, GosiaGosiaJurczakKittl, JorgeJorgeKittl2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/18175On the process and material sensitivities for high-k based dielectricsProceedings paperhttp://semiconchina.semi.org/scchina-en/ProgramsEvents/CTR_012200