Pattern deformation mitigation for EUV photoresists using wafer backside cleaning techniques

Harumoto, MasahikoMasahikoHarumotodos Santos, Andreia FigueiredoAndreia Figueiredodos SantosZanders, WesleyWesleyZandersCaron, ElkeElkeCaronVandereyken, JelleJelleVandereyken2025-08-252024-04-012025-08-2520240021-4922WOS:001183689200001https://imec-publications.be/handle/20.500.12860/43759Pattern deformation mitigation for EUV photoresists using wafer backside cleaning techniquesJournal article10.35848/1347-4065/ad2bbcWOS:001183689200001