Investigation of aggressively scaled HfALOx-based interpoly dielectric stacks for sub-45nm nonvolatile memory technologies

Govoreanu, BogdanBogdanGovoreanuWellekens, DirkDirkWellekensHaspeslagh, LucLucHaspeslaghBrunco, DavidDavidBruncoDe Vos, JoeriJoeriDe VosRuiz Aguado, DanielDanielRuiz AguadoBlomme, PieterPieterBlommevan der Zanden, KoenKoenvan der ZandenVan Houdt, JanJanVan Houdt2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12219Investigation of aggressively scaled HfALOx-based interpoly dielectric stacks for sub-45nm nonvolatile memory technologiesProceedings paper