Characterization and mitigation of 3D mask effects in EUV lithography

Erdmann, AndreasAndreasErdmannXu, DongboDongboXuEvanschitzky, PeterPeterEvanschitzkyLuong, VuVuLuongPhilipsen, VickyVickyPhilipsenHendrickx, EricEricHendrickx2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26605Characterization and mitigation of 3D mask effects in EUV lithographyOral presentation