Self-aligned double patterning process for subtractive Ge Fin fabrication at 45-nm pitch

Milenin, AlexeyAlexeyMileninWitters, LiesbethLiesbethWittersBarla, KathyKathyBarlaThean, AaronAaronThean2021-10-232021-10-2320160040-6090https://imec-publications.be/handle/20.500.12860/27012Self-aligned double patterning process for subtractive Ge Fin fabrication at 45-nm pitchJournal articlehttp://www.sciencedirect.com/science/article/pii/S0040609015007968