Simulation of Ar/Cl2/O2 inductively coupled plasmas used for anisotropic etching of silicon

Tinck, StefanStefanTinckBogaerts, AnnemieAnnemieBogaertsBoullart, WernerWernerBoullart2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16310Simulation of Ar/Cl2/O2 inductively coupled plasmas used for anisotropic etching of siliconMeeting abstract