Experimental validation of rigorous, 3D profile models for negative-tone develop resists

Gao, WeiminWeiminGaoKlostermann, UlrichUlrichKlostermannKamohara, ItaruItaruKamoharaSchmoeller, ThomasThomasSchmoellerLucas, KevinKevinLucasDemmerle, WolfgangWolfgangDemmerleDe Bisschop, PeterPeterDe BisschopMailfert, JulienJulienMailfert2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/23837Experimental validation of rigorous, 3D profile models for negative-tone develop resistsProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1857372