A methodology for double patterning compliant split and design

Wiaux, VincentVincentWiauxVerhaegen, StafStafVerhaegenIwamoto, FumioFumioIwamotoMaenhoudt, MireilleMireilleMaenhoudtMatsuda, TakashiTakashiMatsudaPostnikov, SergeySergeyPostnikovVandenberghe, GeertGeertVandenberghe2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14787A methodology for double patterning compliant split and designProceedings paper