Precursor penetration and sealing of porous CVD SiCOH low k dielectric for atomic layer deposition of WCxNy

Abell, ThomasThomasAbellShamiryan, DenisDenisShamiryanSchuhmacher, JörgJörgSchuhmacherBesling, W.W.BeslingSutcliffe, V.V.SutcliffeMaex, KarenKarenMaex2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7113Precursor penetration and sealing of porous CVD SiCOH low k dielectric for atomic layer deposition of WCxNyProceedings paper