Iodine enhanced focused ion beam etching of silicon for photonic device modification and prototyping

Schrauwen, JonathanJonathanSchrauwenVan Lysebettens, J.J.Van LysebettensVanhoutte, M.M.VanhoutteVan Thourhout, DriesDriesVan ThourhoutBaets, RoelRoelBaets2021-10-172021-10-172008-06https://imec-publications.be/handle/20.500.12860/14448Iodine enhanced focused ion beam etching of silicon for photonic device modification and prototypingProceedings paper