Electrochemical study of copper depostion on silicon surfaces in HF solutions

Teerlinck, IvoIvoTeerlinckGomes, W. P.W. P.GomesStrubbe, K.K.StrubbeMertens, PaulPaulMertensHeyns, MarcMarcHeyns2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/3874Electrochemical study of copper depostion on silicon surfaces in HF solutionsProceedings paper