Jonckheere, RikRikJonckheereVan Den Heuvel, DieterDieterVan Den HeuvelAbe, T.T.AbeHashimoto, H.H.HashimotoHolfeld, C.C.HolfeldHermans, JanJanHermansHendrickx, EricEricHendrickxGoethals, MiekeMiekeGoethalsVandenberghe, GeertGeertVandenbergheRonse, KurtKurtRonse2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15547Lessons learned from correlation between EUV mask inspection, blank inspection and wafer print analysisProceedings paper