Reduction of surface metallic contamination through optimized rinsing and single-wafer drying

Fyen, WimWimFyenHolsteyns, FrankFrankHolsteynsLauerhaas, JeffJeffLauerhaasBearda, TwanTwanBeardaMertens, PaulPaulMertensHeyns, MarcMarcHeyns2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6340Reduction of surface metallic contamination through optimized rinsing and single-wafer dryingProceedings paper