Alternative photoresist removal process to minimize damage of low-k material induced by ash plasma

Le, Quoc ToanQuoc ToanLeKeldermans, JohanJohanKeldermansChiodarelli, NicoloNicoloChiodarelliKesters, ElsElsKestersLux, MarcelMarcelLuxClaes, MartineMartineClaesVereecke, GuyGuyVereecke2021-10-162021-10-162007-11https://imec-publications.be/handle/20.500.12860/12454Alternative photoresist removal process to minimize damage of low-k material induced by ash plasmaProceedings paper