Channel hot-carrier degradation under static stress in short channel transistors with high-k/metal gate stacks

Amat, E.E.AmatKauerauf, ThomasThomasKaueraufDegraeve, RobinRobinDegraeveDe Keersgieter, AnAnDe KeersgieterRodríguez, R.R.RodríguezNafría, M.M.NafríaAymerich, X.X.AymerichGroeseneken, GuidoGuidoGroeseneken2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13300Channel hot-carrier degradation under static stress in short channel transistors with high-k/metal gate stacksProceedings paper