Chemical and electrical characterization of the interaction of BCl 3/Cl2 etching and CF4/H2O stripping plasmas with aluminum surfaces

Proost, JorisJorisProostLi, H.H.LiConard, ThierryThierryConardBoullart, WernerWernerBoullartMaex, KarenKarenMaex2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/3766Chemical and electrical characterization of the interaction of BCl 3/Cl2 etching and CF4/H2O stripping plasmas with aluminum surfacesJournal article