Lateral and vertical scaling impact on statistical performances and reliability of 10nm TiN/Hf(Al)O/Hf/TiN RRAM devices

Fantini, AndreaAndreaFantiniGoux, LudovicLudovicGouxRedolfi, AugustoAugustoRedolfiDegraeve, RobinRobinDegraeveKar, Gouri SankarGouri SankarKarChen, YangyinYangyinChenJurczak, GosiaGosiaJurczak2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/23807Lateral and vertical scaling impact on statistical performances and reliability of 10nm TiN/Hf(Al)O/Hf/TiN RRAM devicesProceedings paperhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=6894433&contentType=Conference+Publications