CMP on SiGe materials - linking chemical and physical properties to design low defect selective slurries

Ong, PatrickPatrickOngSiebert, MaxMaxSiebertHuang, KevinKevinHuangTeugels, LieveLieveTeugelsAnsar, SheikSheikAnsarLeunissen, PeterPeterLeunissen2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/24344CMP on SiGe materials - linking chemical and physical properties to design low defect selective slurriesMeeting abstract