High-k metal gate MOSFETs: Impact of extrinsic process condition on the gate-stack quality. A mobility study

Trojman, LionelLionelTrojmanRagnarsson, Lars-AkeLars-AkeRagnarssonO'Sullivan, BarryBarryO'SullivanRosmeulen, MaartenMaartenRosmeulenKaushik, VidyaVidyaKaushikGroeseneken, GuidoGuidoGroesenekenMaes, HermanHermanMaesDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-162021-10-162007-03https://imec-publications.be/handle/20.500.12860/12995High-k metal gate MOSFETs: Impact of extrinsic process condition on the gate-stack quality. A mobility studyJournal article