DUV Lithography for 0.35 µm CMOS Processing

Van Driessche, VeerleVeerleVan DriesscheGoethals, MiekeMiekeGoethalsOp de Beeck, MaaikeMaaikeOp de BeeckRonse, KurtKurtRonseVan den hove, LucLucVan den hove2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/390DUV Lithography for 0.35 µm CMOS ProcessingOral presentation