Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film

Travaly, YoussefYoussefTravalyEyckens, BrendaBrendaEyckensCarbonell, LaureLaureCarbonellRothschild, AudeAudeRothschildLe, Quoc ToanQuoc ToanLeBrongersma, SywertSywertBrongersmaCiofi, IvanIvanCiofiStruyf, HerbertHerbertStruyfFurukawa, YukikoYukikoFurukawaStucchi, MicheleMicheleStucchiSchaekers, MarcMarcSchaekersBender, HugoHugoBenderRosseel, ErikErikRosseelVanhaelemeersch, SergeSergeVanhaelemeerschMaex, KarenKarenMaexGaillard, F.F.GaillardVan Autryve, LucLucVan AutryveRabinzohn, P.P.Rabinzohn2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6888Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric filmJournal article