Paraschiv, VasileVasileParaschivBoullart, WernerWernerBoullartAltamirano Sanchez, EfrainEfrainAltamirano Sanchez2021-10-212021-10-2120130167-9317https://imec-publications.be/handle/20.500.12860/22906Dry etching of Mo based layers and its interdependence with a poly-Si/MoOxNy/TiN/HfO2 gate stackJournal articlehttp://www.sciencedirect.com/science/article/pii/S0167931712005874